Atomic layer deposition (ALD) precisely controls thin film thickness at the atomic level. This technique sequentially exposes a substrate to gas-phase precursors, enabling the formation of a single atomic layer per cycle. Its uniformity and conformality make it ideal for semiconductors, solar cells, and nanotechnology.

Chemical vapor deposition (CVD) is the generic name for a group of chemical processes that allow the synthesis of thin films trough chemical reactions between gaseous precursor/s and a substrate kept at a given temperature. The process is often used in the semiconductor industry to produce high quality, high-performance solid materials.

In CBD, aggregates formed in the gas-phase are processed in a molecular beam source so to form a collimated beam of particles that once intercepted by a substrate can be used to grow thin films of nanostructured materials. Nanocomposites are produced by co-deposition from multiple sources. Accessible materials are metals, carbon, metal-oxides.

MBE allows to grow high quality semiconductors, oxides and chalcogenide epitaxial layers with crystal structure commensurate with the substrate. It can also be used to build nanostructures, layered heterostructures for photonic and optoelectronic devices, and hybrid semiconductor-superconductor platforms for quantum computation.

PLD is widely used to grow epitaxial thin films of complex oxides and other inorganic materials. It is a simple and versatile technique based in the congruent ablation of a solid material irradiated by a pulsed UV laser and is compatible with H.V. or reactive atmosphere up to 1 mbar. It can be used in combination with real time electron diffraction

Physical vapor deposition (PVD) by sputtering is a process whereby a material is sputtered from a solid target and deposited on a substrate as a film or coating, with thicknesses from sub-nm to several microns, as mono-layered, multi-layered, or multi-graduated structures with well controlled morphology.

TEMPORARILY UNAVAILABLE Organic Molecular Beam Deposition is a H.V. based physical deposition process in which the vaporization of a molecular solid occurs by Joule heating of a crucible. This method is the main way to deposit thin films of organic molecular crystals for organic semiconductor technologies without molecular degradation without use of solvents or chemicals.